Polymers & Resins III

eCFR Subpart OOO [ecfr.gov]

This subpart applies to:

1. Owner/ operators of processes that produce amino or phenolic resins located at Major Sources of HAPs*.

Affected sources:

1. The total of all amino or phenolic resin process units (APPU);
2. Associated heat exchange systems;
3. Any equipment required by or utilized as a method of compliance with this subpart, including control or recovery devices;
4. Equipment, not containing organic HAPs, located within an APPU and is part of an affected source;
5. Vessels and equipment storing and/or handling material that contains no organic HAP and/or organic HAP as impurities only;
6. Equipment intended to operate in organic HAP service for less than 300 hours per calendar year;
7. Waste management units;
8. Maintenance wastewater.

Definition of "Amino Resin":

• A thermoset resin produced through the reaction of formaldehyde, or a formaldehyde containing solution (e.g., aqueous formaldehyde), with compound(s) that contain the amino group; these compounds include melamine, urea, and urea derivatives. Formaldehyde substitutes are exclusively aldehydes

Definition of "Phenolic Resin":

• A thermoset resin that is a condensation product of formaldehyde and phenol, or a formaldehyde substitute and/or a phenol substitute. Substitutes for formaldehyde are exclusively aldehydes and include acetaldehyde or furfuraldehyde. Substitutes for phenol include other phenolic starting compounds such as cresols, xylenols, p-tert-butylphenol, p-phenylphenol, nonylphenol, and resorcinols

*Major Sources of HAPs emit or have the potential to emit:

• ≥ 10 tons/year of any single HAP; or
• ≥ 25 tons/year of total HAPs.
• Area Sources emit less than Major Sources.

Exempt to this Subpart:

1. APPU for which the production of all amino/phenolic resins has been terminated and for which the production of any amino/phenolic resins in the future is not anticipated.

Partial Exemption to this Subpart:

1. APPU of an affected source which does not use or manufacture any organic HAP.
   1. Requires documented proof APPU should be exempt.
2. Affected sources with actual annual production of amino/phenolic resin ≤ 800 megagrams per year (Mg/year) are exempt from equipment leak provisions in §63.1410.
   1. Must not have exceeded ≤ 800 Mg/year threshold in any annual production check since December 14, 1998.

No

NESHAP - 40 CFR Part 63

Subpart U - Polymers & Resins I
Subpart W - Polymers & Resins II
Subpart JJJ - Polymers & Resins IV

eCFR Subpart OOO [ecfr.gov]

Source Classification

1. Existing Sources = Commence construction or reconstruction on or before December 14, 1998.
2. New Sources = Commence construction or reconstruction after December 14, 1998.
   1. Each additional group of 1+ APPU and associated heat exchange systems which commence construction or reconstruction after December 14, 1998.
   2. Each group of one or more process units and associated heat exchange systems that are converted to APPUs after December 14, 1998, that has the potential to emit 10 tons per year or more of any organic HAP or 25 tons per year or more of any combination of organic HAP